Descripción
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The lattice order degree and the strain in as-grown, Mn-implanted and post-implanted annealed InAs thin films were investigated with depth resolution by means of Rutherford backscattering spectrometry in channeling conditions (RBS/C). Three main crystallographic axes were analyzed for both In and As sublattices. The behaviour of the induced defects was evaluated in two regions with different native defects: the interface and the surface. The results show that Mn implantation and post-implantation annealing are anisotropic processes, affecting in a different way the In and As sublattices. The mechanisms influencing the enhancement and deterioration of the crystal quality during the implantation are discussed in relation to the as-grown defects and the segregation of the elements | |
Internacional
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Si |
JCR del ISI
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Si |
Título de la revista
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Nuclear Instruments and Methods in Physics Research B |
ISSN
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0167-5087 |
Factor de impacto JCR
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0 |
Información de impacto
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Volumen
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269 |
DOI
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10.1016/j.nimb.2011.02.004 |
Número de revista
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Desde la página
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733 |
Hasta la página
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738 |
Mes
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SIN MES |
Ranking
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