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Memorias de investigación
Communications at congresses:
Fabrication process of Mo/Au TES at RT (POSTER)
Year:2011
Research Areas
  • Engineering
Information
Abstract
We report on the fabrication details of TES based on Mo/Au bilayers. The Mo layer is deposited by radio frequency (RF) sputtering and capped with a sputter deposited thin Au protection layer. Afterwards, a second Au layer of suitable (lower) resistivity is deposited ex?situ by e?beam evaporation, until completion of the total desired Au thickness. The deposition was performed at room temperature (RT) on LPCVD Si3N4 membranes. Such a deposition procedure is very reproducible and allow controlling the critical temperature (Tc) and normal electrical resistance (RN) of the Mo/Au bilayer. The process is optimized to achieve low stress bilayers, thus avoiding the undesirable curvature of the membranes. Bilayers are patterned using photolithographic techniques and wet etching procedures. Mo superconducting paths are used to contact the Mo/Au bilayers, thus ensuring good electrical conductivity and thermal isolation. The entire fabrication process let to stable and reproducible sensors with required and tunable functional properties
International
Si
Congress
14th International Workshop on Low Temperature Detectors
960
Place
Heidelberg, Alemania
Reviewers
Si
ISBN/ISSN
0000-0000
Start Date
01/08/2011
End Date
05/08/2011
From page
0
To page
0
Proceedings of the Workshop
Participants
  • Autor: I. Fernández-Martínez (Instituto de Microelectrónica de Madrid (CSIC))
  • Autor: M. Parra-Borderías (Instituto de Ciencia de Materiales de Aragón)
  • Autor: O. Gil (Institut de Ciència de Materials de Barcelona (CSIC))
  • Autor: A. Camón (Instituto de Ciencia de Materiales de Aragón)
  • Autor: L. Fábrega (Institut de Ciència de Materials de Barcelona (CSIC))
  • Autor: J.L. Costa-Krämer (Instituto de Microelectrónica de Madrid (CSIC))
  • Autor: Raquel Gonzalez Arrabal (UPM)
  • Autor: J. Sesé (Instituto de Nanociencia de Aragón)
  • Autor: F. Briones (Instituto de Microelectrónica de Madrid (CSIC))
Research Group, Departaments and Institutes related
  • Creador: Grupo de Investigación: Fusión Nuclear Inercial y Tecnología de fusión
  • Centro o Instituto I+D+i: Instituto de Fusión Nuclear
  • Departamento: Ingeniería Nuclear
S2i 2020 Observatorio de investigación @ UPM con la colaboración del Consejo Social UPM
Cofinanciación del MINECO en el marco del Programa INNCIDE 2011 (OTR-2011-0236)
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