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Memorias de investigación
Communications at congresses:
Nanostructures with Group IV nanocrystals obtained by LPCVD and annealing of SiGeO layers
Year:2008
Research Areas
  • Electronics engineering
Information
Abstract
Nanocrystals embedded in an oxide matrix have been fabricated by annealing SiGeO films deposited by LPCVD. The composition of the oxide layers and its evolution after annealing as well as the presence and nature of nanocrystals in the films have been studied by several experimental techniques. The results are analyzed and discussed in terms of the main deposition parameters and the annealing temperature.
International
Si
Congress
Materials Research Society 2008 Spring Meeting
960
Place
San Francisco, California, EEUU
Reviewers
Si
ISBN/ISSN
Start Date
24/03/2008
End Date
28/03/2008
From page
2
To page
7
Amorphous and Polycristalline Silicon Science and Technology 2008
Participants
  • Participante: A Kling
  • Participante: B. Morana
  • Autor: Jesus Sangrador Garcia (UPM)
  • Autor: Francisco J. Jimenez Leube (UPM)
  • Participante: O. Martínez
  • Autor: Andres Rodriguez Dominguez (UPM)
  • Autor: Tomas Rodriguez Rodriguez (UPM)
Research Group, Departaments and Institutes related
  • Creador: Departamento: Tecnología Electrónica
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