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Memorias de investigación
Communications at congresses:
Ontology Analysis Based on Ontology Design Patterns
Year:2009
Research Areas
  • Artificial intelligence
Information
Abstract
The so-called Ontology Design Patterns (ODPs), which have been defined as solutions to ontological design problems, are of great help to developers when modelling ontologies since these patterns provide a development guide and improve the quality of the resulting ontologies. However, it has been demonstrated that, in many cases, developers encounter difficulties when they have to reuse ontology design patterns and include errors in the modelling. Thus, to avoid errors in ontology modelling, this paper proposes classifying errors into two types: (1) errors related to existing ODPs, called anti-patterns, and (2) errors not related to existing ODPs, called worst practices. This classification is the result of analysing a set of ontologies which come from an academic experiment. In addition, the paper presents a general classification of the worst practices found and a set of worst practice examples. Finally, the paper shows an example of how the aforementioned worst practices could be related among them.
International
Si
Congress
WOP 2009 ¿ Workshop on Ontology Patterns at the 8th International Semantic Web Conference (ISWC 2009)
960
Place
Washington, DC
Reviewers
Si
ISBN/ISSN
1613-0073
Start Date
25/10/2009
End Date
25/10/2009
From page
155
To page
162
Proceedings of the WOP 2009. CEUR Workshop Proceedings
Participants
  • Autor: Maria Poveda Villalon (UPM)
  • Autor: M. Carmen Suarez de Figueroa Baonza (UPM)
  • Autor: Asuncion de Maria Gomez Perez (UPM)
Research Group, Departaments and Institutes related
  • Creador: Grupo de Investigación: Ontology Engineering Group (LIA). Laboratorio Inteligencia Artificial. Grupo de Ingeniería Ontológica
  • Departamento: Inteligencia Artificial
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