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Memorias de investigación
Communications at congresses:
SiOx as low acoustic impedance material for Bragg mirror fabrication in BAW resonators
Year:2009
Research Areas
  • Electronics engineering
Information
Abstract
In this paper we describe the procedure to sputter low acoustic impedance SiO2 films to be used as low acoustic impedance layer in Bragg mirrors for BAW resonators. The composition and structure of the material are assessed through infrared absorption spectroscopy. The acoustic properties of the films (mass density and sound velocity) are assessed through X-ray reflectometry and picosecond acoustic spectroscopy. A second measurement of the sound velocity is achieved through the analysis of the longitudinal ¿/2 resonance that appears in these silicon oxide films when used as uppermost layer of an acoustic reflector placed under an AlN-based resonator.
International
Si
Congress
2009 IEEE International Frequency Control Symposium
960
Place
Besançon
Reviewers
Si
ISBN/ISSN
1075-6787
Start Date
20/04/2009
End Date
24/04/2009
From page
316
To page
321
2009 IEEE International Frequency Control Symposium Proc.
Participants
  • Participante: E. Wegmann (Universidad Politécnica de Madrid)
  • Participante: L. Vergara (ICMM-CSIC)
  • Autor: Jimena Olivares Roza (UPM)
  • Participante: R. Aigner (TriQuint Semiconductor, USA)
  • Autor: Marta Clement Lorenzo (UPM)
  • Participante: J. Capilla (Universidad Politécnica de Madrid)
  • Autor: Enrique Iborra Grau (UPM)
Research Group, Departaments and Institutes related
  • Creador: Grupo de Investigación: Microsistemas y Materiales Electrónicos
  • Departamento: Tecnología Electrónica
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