Observatorio de I+D+i UPM

Memorias de investigación
Communications at congresses:
Common Pitfalls in Ontology Development
Year:2010
Research Areas
  • Artificial intelligence
Information
Abstract
The so-called Ontology Design Patterns (ODPs), which have been defined as solutions to ontological design problems, are of great help to developers when modelling ontologies since these patterns provide a development guide and improve the quality of the resulting ontologies. However, it has been demonstrated that, in many cases, developers encounter difficulties when they have to reuse the correct design patterns and include errors in the modelling. Thus, to avoid pitfalls in ontology modelling, this paper proposes classifying errors into two types: (1) errors related to existing ODPs, called anti-patterns, and (2) errors not related to existing ODPs, called pitfalls. This classification is the result of analysing a set of ontologies. This paper is focused on the pitfalls identified during the analysis. In addition the paper presents a classification of the pitfalls found and a set of pitfall examples.
International
Si
Congress
The 13th Conference of the Spanish Association for Artificial Intelligence, CAEPIA 2009
960
Place
Sevilla, España
Reviewers
Si
ISBN/ISSN
978-3-642-14263-5
Start Date
09/11/2009
End Date
13/11/2009
From page
91
To page
100
Current Topics in Artificial Intelligence 13th Conference of the Spanish Association for Artificial Intelligence, CAEPIA 2009, Seville, Spain, November 9-13, 2009. Selected Papers
Participants
  • Autor: Maria Poveda Villalon (UPM)
  • Autor: M. Carmen Suarez de Figueroa Baonza (UPM)
  • Autor: Asuncion de Maria Gomez Perez (UPM)
Research Group, Departaments and Institutes related
  • Creador: Grupo de Investigación: Ontology Engineering Group (LIA). Laboratorio Inteligencia Artificial. Grupo de Ingeniería Ontológica
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