Descripción
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Low opticaldegradationinGaInAsN(Sb)/GaAsquantumdots(QDs)p?i?nstructuresemittingupto 1.55 mm ispresentedinthispaper.WeobtainemissionatdifferentenergiesbymeansofvaryingN contentfrom1to4%.Thesamplesshowalowphotoluminescence(PL)intensitydegradationofonly 1 orderofmagnitudewhentheyarecomparedwithpureInGaAsQDstructures,evenforanemission wavelengthaslargeas1.55 mm. Theoptimizationstudiesofthesestructuresforemissionat1.55 mmare reportedinthiswork.HighsurfacedensityandhomogeneityintheQDlayersareachievedfor50%In contentbyrapiddecreaseinthegrowthtemperatureaftertheformationofthenanostructures.Besides, the effectofNandSbincorporationintheredshiftandPLintensityofthesamplesisstudiedbypost- growth rapidthermalannealingtreatments.Asageneralconclusion,weobservethattheadditionofSbto QD withlowNmolefractionismoreefficienttoreach1.55 mm andhighPLintensitythanusinghighN incorporationintheQD.Also,thegrowthtemperatureisdeterminedtobeanimportantparameterto obtain goodemissioncharacteristics.Finally,wereportroomtemperaturePLemissionofInGaAsN(Sb)/ GaAs at1.4 mm. | |
Internacional
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JCR del ISI
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Título de la revista
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Journal of Crystal Growth |
ISSN
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0022-0248 |
Factor de impacto JCR
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0 |
Información de impacto
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Volumen
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DOI
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Número de revista
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Desde la página
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215 |
Hasta la página
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218 |
Mes
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SIN MES |
Ranking
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