Observatorio de I+D+i UPM

Descripción
This work describes the assessment of the acoustic properties of sputtered tantalum oxide films intended as high impedance films for the acoustic isolation of bulk acoustic wave devices operating in the GHz frequency range. The films are grown by sputtering a metallic tantalum target under different oxygen and argon gas mixtures, total pressures, pulsed DC powers and substrate bias. The structural properties of the films are assessed through infrared absorption spectroscopy and Xray diffraction measurements. Their acoustic impedance is obtained after estimating the mass density by X-ray reflectometry measurements and the longitudinal acoustic velocity by analyzing the longitudinal ?/2 resonance induced in a tantalum oxide film inserted between an acoustic reflector and an AlN-based resonator. A second measurement of the sound velocity is achieved through picosecond acoustic spectroscopy.
Internacional	Si
Nombre congreso	2011 IEEE Frequency Control Symposium
Tipo de participación	960
Lugar del congreso	San Francisco, EE. UU.
Revisores	Si
ISBN o ISSN	1075-6787
DOI	10.1109/FCS.2011.5977833
Fecha inicio congreso	01/05/2011
Fecha fin congreso	05/05/2011
Desde la página	1
Hasta la página	6
Título de las actas	2011 IEEE International Frequency Control Symposium Proc.

Esta actividad pertenece a memorias de investigación

• Autor: José Capilla Osorio (UPM)
• Autor: Jimena Olivares Roza (UPM)
• Autor: Marta Clement Lorenzo (UPM)
• Autor: Jesus Sangrador Garcia (UPM)
• Autor: Enrique Iborra Grau (UPM)
• Autor: Arnaud Devos (IEMN Dpt ISEN, UMR CNRS 8520, Lille, Francia)

• Creador: Grupo de Investigación: Microsistemas y Materiales Electrónicos
• Centro o Instituto I+D+i: Centro de Materiales y Dispositivos Avanzados para Tecnologías de Información y Comunicaciones
• Departamento: Tecnología Electrónica