Memorias de investigación
Communications at congresses:
Characterization of Amorphous Tantalum Oxide for Insulating Acoustic Mirrors
Year:2011
Research Areas
  • Electronic technology and of the communications
Information
Abstract
This work describes the assessment of the acoustic properties of sputtered tantalum oxide films intended as high impedance films for the acoustic isolation of bulk acoustic wave devices operating in the GHz frequency range. The films are grown by sputtering a metallic tantalum target under different oxygen and argon gas mixtures, total pressures, pulsed DC powers and substrate bias. The structural properties of the films are assessed through infrared absorption spectroscopy and Xray diffraction measurements. Their acoustic impedance is obtained after estimating the mass density by X-ray reflectometry measurements and the longitudinal acoustic velocity by analyzing the longitudinal ?/2 resonance induced in a tantalum oxide film inserted between an acoustic reflector and an AlN-based resonator. A second measurement of the sound velocity is achieved through picosecond acoustic spectroscopy.
International
Si
Congress
2011 IEEE Frequency Control Symposium
960
Place
San Francisco, EE. UU.
Reviewers
Si
ISBN/ISSN
1075-6787
10.1109/FCS.2011.5977833
Start Date
01/05/2011
End Date
05/05/2011
From page
1
To page
6
2011 IEEE International Frequency Control Symposium Proc.
Participants
Research Group, Departaments and Institutes related
  • Creador: Grupo de Investigación: Microsistemas y Materiales Electrónicos
  • Centro o Instituto I+D+i: Centro de Materiales y Dispositivos Avanzados para Tecnologías de Información y Comunicaciones
  • Departamento: Tecnología Electrónica