Abstract
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W nanocrystalline films with a thickness of 0.5 ?m consisting on densely packed columns with a lateral size of the order of 10 nm were deposited by DC magnetron (RF) sputtering on Si substrates. In order to study their structural stability as function of temperature some of the samples were ex-situ annealed at different temperatures (T<1000ºC) in an Ar atmosphere. Results are compared to the polycrystalline W to be used in ITER. The structural properties of the samples were investigated prior to and after annealing by means of X-ray diffraction (XRD) and scanning electron microscopy (SEM). Experimental data evidence that nanograins support quite well the thermal treatments without significant changes in their size. | |
International
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No |
Congress
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2nd Workshop of Technofusion |
Entity
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CIEMAT |
Entity Nationality
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ESPAÑA |
Place
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MAdrid (Spain) |
Start Date
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18/06/2012 |
End Date
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19/06/2012 |