Artículos en revistas:
High quality textured ZnO:Al surfaces obtained by a two-step wet-chemical etching method for applications in thin film silicon solar cells
High quality textured ZnO:Al surfaces obtained by a two-step wet-chemical etching method for applications in thin film silicon solar cells
Año:2011
Áreas de investigación
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Física, -
Fisica sb -- semiconductores y estructura de bandas
Datos
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Descripción
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| ZnO:Al films deposited at 250 1C on Corning glass by radio frequency magnetron sputtering were studied for their use as front contact for thin film silicon solar cells. For this purpose, a two-step etching method combining different concentrations of diluted hydrochloric acid (from 0.1% to 3%) with different etching times was developed. Its influence on morphological, electrical and optical properties of the etched films was evaluated. This new etching method led to more uniform textured surfaces, where the electrical properties remained unchangeable after the etching process, and with adapted light scattering properties similar to those exhibited by commercial substrates. | |
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Internacional
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Si |
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JCR del ISI
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Si |
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Título de la revista
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Solar Energy Materials And Solar Cells |
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ISSN
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0927-0248 |
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Factor de impacto JCR
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4,593 |
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Información de impacto
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Volumen
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95 |
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DOI
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10.1016/j.solmat.2011.03.042 |
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Número de revista
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Desde la página
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2281 |
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Hasta la página
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2286 |
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Mes
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SIN MES |
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Ranking
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Participantes
- Autor: Oscar de Abril Torralba (UPM)
Grupos de investigación, Departamentos, Centros e Institutos de I+D+i relacionados
- Creador: Departamento: Física e Instalaciones Aplicadas a la Edificación, al Medio Ambiente y al Urbanismo
S2i 2023 Observatorio de investigación @ UPM con la colaboración del Consejo Social UPM
Cofinanciación del MINECO en el marco del Programa INNPACTO (IPT-020000-2010-22)