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Abstract
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| Optical waveguides are key elements of many photonic devices; for this reason many materials and methods have been intensively studied to fabricate them. Ion implantation provides a general and flexible method to achieve this goal, with several advantages over the alternative techniques (Townsend et al., 1994). Most optical waveguides and integrated optical devices are manufactured using low-energy light ions (H and He), taking advantage of the effects caused by nuclear damage. However, this is achieved at the expense of using very high fluences (1016-1017 cm-2), which reduces the practical utility of the method | |
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International
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Si |
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Book Edition
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Book Publishing
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Edited by Mark Goorsky |
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ISBN
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978-953-51-0634-0 |
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Series
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Book title
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Ion Implantation, InTech |
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From page
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267 |
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To page
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314 |