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Descripción
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| We present a detailed study of the wavelength influence in pulsed laser annealing of amorphous silicon thin films, comparing the results for material modification at different fluence regimes both in the three fundamental harmonics of standard DPSS laser sources, UV (355 nm), visible (532 nm) and IR (1064 nm), and KrF (248 nm) excimer laser sources. Samples of hydrogenated amorphous silicon thin films were irradiated and characterized with MicroRaman techniques. A finite element model (FEM) was developed in COMSOL to simulate the process. The numerical and experimental results are presented, proving that the process can be predicted with a model based on heat transport. | |
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Internacional
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Si |
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JCR del ISI
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No |
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Título de la revista
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Physics Procedia |
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ISSN
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1875-3892 |
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Factor de impacto JCR
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Información de impacto
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Volumen
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39 |
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DOI
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Número de revista
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Desde la página
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286 |
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Hasta la página
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294 |
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Mes
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SIN MES |
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Ranking
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