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Descripción
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| This work addresses heat losses in a CVD reactor for polysilicon production. Contributions to the energy consumption of the so-called Siemens process are evaluated, and a comprehensive model for heat loss is presented. A previously-developed model for radiative heat loss is combined with conductive heat loss theory and a new model for convective heat loss. Theoretical calculations are developed and theoretical energy consumption of the polysilicon deposition process is obtained. The model is validated by comparison with experimental results obtained using a laboratory-scale CVD reactor. Finally, the model is used to calculate heat consumption in a 36-rod industrial reactor; the energy consumption due to convective heat loss per kilogram of polysilicon produced is calculated to be 22?30 kWh/kg along a deposition process. | |
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Internacional
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Si |
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JCR del ISI
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Si |
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Título de la revista
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Journal of Crystal Growth |
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ISSN
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0022-0248 |
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Factor de impacto JCR
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Información de impacto
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Volumen
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DOI
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Número de revista
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402 |
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Desde la página
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138 |
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Hasta la página
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146 |
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Mes
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SIN MES |
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Ranking
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