Artículos en revistas:
MEASUREMENT OF PLASMA ELECTRON DENSITY GENERATED IN AN EXPERIMENT OF LASER SHOCK PROCESSING, UTILIZING THE H?-line
MEASUREMENT OF PLASMA ELECTRON DENSITY GENERATED IN AN EXPERIMENT OF LASER SHOCK PROCESSING, UTILIZING THE H?-line
Año:2016
Áreas de investigación
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Fisica am -- fisica atomica y molecular, -
Fisica id -- instrumentacion y analisis de datos,
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Ingenieria mecanica
Datos
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Descripción
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| In this work we have realized plasma diagnosis produced by Laser (LPP), by means of emission spectroscopy in a Laser Shock Processing (LSP). The LSP has been proposed as an alternative technology, competitive with classical surface treatments. The ionic species present in the plasma together with electron density and its temperature provide significant indicators of the degree of surface effect of the treated material. In order to analyze these indicators, we have realized spectroscopic studies of optical emission in the laser-generated plasmas in different situations. We have worked focusing on an aluminum sample (Al2024) in air and/or in LSP conditions (water flow) a Q-switched laser of Nd:YAG (? = 1.06 ?m, 10 ns of pulse duration, running at 10 Hz repetition rate). The pulse energy was set at 2,5 J per pulse. The electron density has been measured using, in every case, the Stark broadening of H Balmer ? line (656.27 nm). In the case of the air, this measure has been contrasted with the value obtained with the line of 281.62 nm of Al II. Special attention has been paid to the self-absorption of the spectral lines used. The measures were realized with different delay times after the pulse of the laser (1?8 ?s) and with a time window of 1 ?s. In LSP the electron density obtained was between 1017 cm?3 for the shortest delays (4?6 ?s), and 1016 cm?3 for the greatest delays (7,8 ?s). | |
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Internacional
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JCR del ISI
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Título de la revista
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Journal of Materials Processing Technology |
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ISSN
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0924-0136 |
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Factor de impacto JCR
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2,041 |
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Información de impacto
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Datos JCR del año 2013 |
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Volumen
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232 |
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DOI
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10.1016/j.jmatprotec.2016.01.026 |
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Número de revista
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Desde la página
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9 |
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Hasta la página
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18 |
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Mes
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JUNIO |
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Ranking
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Participantes
- Autor: Cristina Moreno Diaz (UPM)
- Autor: Aurelia Alonso Medina (UPM)
- Autor: Cristobal Colon Hernandez (UPM)
- Autor: Juan Antonio Porro Gonzalez (UPM)
- Autor: Jose Luis Ocaña Moreno (UPM)
Grupos de investigación, Departamentos, Centros e Institutos de I+D+i relacionados
- Creador: Departamento: Física Aplicada e Ingeniería de Materiales
- Departamento: Ingeniería Eléctrica, Electrónica Automática y Física Aplicada
S2i 2023 Observatorio de investigación @ UPM con la colaboración del Consejo Social UPM
Cofinanciación del MINECO en el marco del Programa INNPACTO (IPT-020000-2010-22)