Descripción
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In this paper we present two software tools for the simulation of electron multiplication processes in radio frequency (RF) waveguides. The electric discharges are caused by the multiplication of a small initial number of electrons. These are accelerated by the RF ¯eld and produce new electrons either by collisions with the walls of the waveguide (ripping new electrons from them), or by ionization of the neutral atoms of a gas inside the device. MEST allows simulating the Multipactor e®ect, a discharge produced in vacuum and generated by the collision of the electrons with the walls. CEST simulates the discharge when in addition a neutral gas is present in the waveguide, at pressures lower than ground levels (often denominated Corona discharge). The main characteristic of both tools is that they implement individual-based, microscopic models, where every electron is individually represented and tracked. In the case of MEST, the simulation is discrete- event, as the trajectory of each electron can be computed analytically. In CEST we use a hybrid simulation approach. The trajectory of each electron is governed by the Langevin stochastic di®erential equations that take into account a deterministic RF electric force and the random interaction with the neutral atom background. In addition, wall and ionizing collisions are modelled as discrete events. The tools allow performing batches of simulations with di®erent wall coating materials and gasses, and have produced results in good agreement with experimental and theo- retical data. The di®erent output forms generated at run-time have proven to be very useful in order to analyze the di®erent discharge processes. The tools are valuable for the selection of the most promising coating materials for the construction of the waveguide, as well as for the identification of safe operating parameters | |
Internacional
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Si |
JCR del ISI
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Si |
Título de la revista
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SIMULATION MODELLING PRACTICE AND THEORY |
ISSN
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1569-190X |
Factor de impacto JCR
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0,375 |
Información de impacto
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Volumen
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78 |
DOI
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10.1016.j.simpat.2008.08.002 |
Número de revista
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0 |
Desde la página
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026407-1 |
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6 |
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AGOSTO |
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