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Abstract
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|---|---|
| Validation of a chemical vapour deposition model for polysilicon by a lab reactor | |
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International
|
Si |
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Congress
|
Silicon for the Chemical and Solar Industry IX |
|
|
960 |
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Place
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Oslo, Noruega |
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Reviewers
|
Si |
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ISBN/ISSN
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00-0000-0000 |
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Start Date
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23/06/2008 |
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End Date
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26/06/2008 |
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From page
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103 |
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To page
|
112 |
|
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Proceedings at www.material.ntnu.no/si-meeting |