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Descripción
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| This work is devoted to the study of new characterization methods for the assessment, optimization and control of laser scribing processes used in the fabrication of thin film PV modules based on hydrogenated amorphous silicon. In that sense, we present an original approach to estimate the heat affected zone generated in the laser irradiation process. We used high resolution VIS-IR FT spectrometry at micro-scale level for measuring the refractive index variations at different distances from the scribed lines in a-Si:H samples specifically designed for this study. We present results for different irradiation conditions both in in geometry (direct and backscribing configurations) and laser parameters (wavelength, repetition rate and pulse duration) reproducing standard interconnection conditions. Additionally, the authors give details about how this technique could be used to optimize and control the laser process parametrization in monolithic. | |
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Internacional
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Si |
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Nombre congreso
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E-MRS 2009 Spring Meeting |
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Tipo de participación
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960 |
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Lugar del congreso
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Estrasburgo, Francia |
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Revisores
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Si |
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ISBN o ISSN
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1546-198X |
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DOI
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Fecha inicio congreso
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08/06/2009 |
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Fecha fin congreso
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12/06/2009 |
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Desde la página
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0 |
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Hasta la página
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0 |
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Título de las actas
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The proceedings will be published as Sensor Letters Special Issue (American Scientific Publisher) |