Observatorio de I+D+i UPM

Memorias de investigación
Ponencias en congresos:
Micro-Raman study of the thermal affected zone generated after a laser scribing process in a-Si:H photovoltaic thin films
Año:2009
Áreas de investigación
  • Materiales magnéticos
Datos
Descripción
Laser scribing processes are being extensi ely used in thin-film photovoltaic (PV technology. In particular, the fabricati n of thin-film PV modules requires la er seribing steps for the monolithic series interconnecti n of the cells. In that sense. in order to perfi rm thin-film PV modules based on hydrogenated amorphous silicon (a-Si:H). selective ablation (by mean of laser direct or back-scribing) of this intrin i material is required. Depending on the laser parameters employed in the ablation process (wav length, pulse duration, frequenc and pulse en rgy), the generatian of a thermal affected zone in the vicinity of the patterned area is expectcd, esp cially when laser sources with ns pulse duration are employed. In faet, sueh thermal effee induccd in the a-Si:H intrinsic layer could lead to an impov ri hmcnl of the eleetrical properties of the final module. In this work a mierostrueture study of the zone c!osest to the laser pattemed area was carried out. Miero-Raman speetroscopy was employed for the analy is of laser pattemed a-Si:H laycrsdeposited by PE VD onto glass substratcs. The inOuenee of the laser wav length \-vas cvaluated using three diffi rcnt radiations for the a-Si:H pattemi.ng (355, 532 and 1064 nm). A clear transition from lhe amorphous to highly erystalline síli on is obtained a zones closer to the laser pattemed area were evaluated.
Internacional
Si
Nombre congreso
19th International Congress on Photonics in Europe. World of Photonics Congress. Lasers in Manufacturing 2009. LIM 2009
Tipo de participación
960
Lugar del congreso
Munich, Alemania
Revisores
Si
ISBN o ISSN
978-3-00-027994-2
DOI
Fecha inicio congreso
15/06/2009
Fecha fin congreso
18/06/2009
Desde la página
635
Hasta la página
640
Título de las actas
Proceedings of the Fifth International WLT-Conference. Lasers in Manufacturing 2009. LIM 2009
Esta actividad pertenece a memorias de investigación
Participantes
  • Participante: O. NOS (CeRMAE Dept. Física Aplicada i Óptica, Universitat de Barcelona)
  • Autor: Mónica Colina Brito (UPM)
  • Autor: Carlos Luis Molpeceres Alvarez (UPM)
  • Autor: Maria Isabel Sanchez Aniorte (UPM)
  • Autor: Sara Lauzurica Santiago (UPM)
  • Autor: Juan José García-Ballesteros . (UPM)
Grupos de investigación, Departamentos, Centros e Institutos de I+D+i relacionados
  • Creador: Grupo de Investigación: Ingeniería y Aplicaciones del Láser
  • Centro o Instituto I+D+i: Centro Laser
  • Departamento: Automática, Ingeniería Electrónica e Informática Industrial
  • Departamento: Física Aplicada a la Ingeniería Industrial
S2i 2021 Observatorio de investigación @ UPM con la colaboración del Consejo Social UPM
Cofinanciación del MINECO en el marco del Programa INNCIDE 2011 (OTR-2011-0236)
Cofinanciación del MINECO en el marco del Programa INNPACTO (IPT-020000-2010-22)