Electron beam lithography equipment enabling designs of less than 50 nm to be carried out. The beam has a minimum diameter of 2 nm. The system has also been recently updated with a high precision interferometric stage.<\/p>\n
– Production of all kinds of nanometric devices using electron beams.
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– Training in the use of electron beam lithography<\/p>\n
It is increasingly necessary to produce devices with nanometric sizes. Devices of these sizes have different properties from micro-millimetric devices. Their high aspect ratio means that they are more sensitive devices that consume less energy.<\/p>\n
Nanotechnology, electronics, optoelectronics, photonics, energy, spintronics.<\/p>\n
It is the equipment with the highest resolution for producing nanometric devices in the country. It is up-to-date with the very best features and is the testing and demonstrating bench for the Japanese company in Europe.<\/p>\n
National projects, European projects, international projects.<\/p>\n
ISOM. HTSE for Telecommunications<\/p>\n