Observatorio de I+D+i UPM

Memorias de investigación
Communications at congresses:
Studying the damage kinetics in silicon dioxide by optical reflectance (Poster)
Year:2013
Research Areas
  • Engineering
Information
Abstract
Silicon dioxide (SiO2) is an important dielectric material with a very wide transparency range and many applications in fields like photonics and microelectronics [1]. It may be found in either an amorphous (silica) or a crystalline (?-quartz) phase. The study of defects created by irradiation in SiO2 is relevant for nuclear (both fusion and fission) facilities [2] and space applications [3,4]. Hence, it is not surprising that several techniques like infrared spectroscopy, spectroscopic ellipsometry and RBS/C (in ?-quartz) have been used to study the irradiation damage. In this work we have used in-situ optical reflectance to obtain detailed information about the damage kinetics.
International
Si
Congress
17th International Conference On Radiation Effects In Insulators (REI-17)
960
Place
Helsinki, Finlandia
Reviewers
Si
ISBN/ISSN
0000-0000
Start Date
30/06/2013
End Date
05/07/2013
From page
1
To page
1
Proceedings
Participants
  • Autor: Antonio Juan Rivera de Mena (UPM)
  • Autor: M.L: Crespillo (Centro de Microanálisis de Materiales, Universidad Autónoma de Madrid)
  • Autor: J. Olivares (Centro de Microanálisis de Materiales, Universidad Autónoma de Madrid)
  • Autor: F. Agulló-López (Centro de Microanálisis de Materiales, Universidad Autónoma de Madrid)
Research Group, Departaments and Institutes related
  • Creador: Grupo de Investigación: Fusión Nuclear Inercial y Tecnología de fusión
  • Centro o Instituto I+D+i: Instituto de Fusión Nuclear
  • Departamento: Ingeniería Nuclear
S2i 2021 Observatorio de investigación @ UPM con la colaboración del Consejo Social UPM
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