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Descripción
Nanoimprint lithography (NIL) is an imprinting technique which has experienced an increasing popularity due to its versatility in fabrication processes. Commercial NIL machines are readily available achieving high quality results; however, these machines involve a relatively high investment. Hence, small laboratories often choose to perform NIL copies in a more rudimentary and cheaper way. A new simple system is presented in this document. It is based on two devices which can be made in-house in plastic by using a 3D printer or in aluminum. Thus, the overall manufacturing complexity is vastly reduced. The presented system includes pressure control and potentially temperature control. Replicas have been made using a sawtooth grating master with a pitch around half micrometre. High quality patterns with low density of imperfections have been achieved in 2.25 cm2 surfaces. The material chosen for the negative intermediary mould is PDMS. Tests of the imprint have been performed using the commercial hybrid polymer Ormostamp.
Internacional	Si
JCR del ISI	Si
Título de la revista	Review of Scientific Instruments
ISSN	0034-6748
Factor de impacto JCR	1,336
Información de impacto	Datos JCR del año 2015
Volumen	89
DOI	10.1063/1.5009648
Número de revista
Desde la página	025106-1
Hasta la página	025106-6
Mes	FEBRERO
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Esta actividad pertenece a memorias de investigación

• Autor: Manuel Caño Garcia (UPM)
• Autor: Morten Andreas Geday (UPM)
• Autor: Manuel Gil Valverde (UPM)
• Autor: Antonio Megias Zarco (UPM)
• Autor: Jose Manuel Oton Sanchez (UPM)
• Autor: Patxi Xabier Quintana Arregui (UPM)

• Creador: Centro o Instituto I+D+i: Centro de Materiales y Dispositivos Avanzados para Tecnologías de Información y Comunicaciones
• Departamento: Tecnología Fotónica y Bioingeniería