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Descripción
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| ¿A new approach for laser monolithic interconnection has been stated with the evaluation of each step ¿For the first step it has been demonstrated that the process has been improved compared with the currently performed ¿The possibility to carry out the P2 and P3 process from the film side has been established as a potential industrial configuration with new laser sources. ¿We¿ve shown a new method to characterize the heat affected zone, focused on the P2 process and the damage assessment of the silicon structure. | |
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Internacional
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Si |
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Nombre congreso
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3RD INTERNATIONAL CONFERENCE ON SURFACES, COATINGS AND NANOSTRUCTURES MATERIALS. NANOSMAT 2008 |
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Tipo de participación
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960 |
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Lugar del congreso
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BARCELONA |
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Revisores
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Si |
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ISBN o ISSN
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0000000000 |
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DOI
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Fecha inicio congreso
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21/10/2008 |
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Fecha fin congreso
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24/10/2008 |
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Desde la página
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1 |
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Hasta la página
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1 |
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Título de las actas
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PRESENTACIÓN |