Site card
Nanolithography equipment, model CABL-9500C
Where:
University Optoelectronics and Microtechnology Systems Institute
Ubicación:
09C.00.010.0 SALA FOTOLITOGRAFÍA ISOM
Typology:
Infraestructura Científica y Técnica Singular (ICTS)
Manager: manuel.abuin@upm.es
Email:
Nanolithography equipment, model CABL-9500C
Micro- and nano-manufacturing of devices.
It allows micrometric or nanometric structures to be produced using an electron beam.
It is used to research and develop new prototypes of micrometric or nanometric devices.
Nanotechnology
This equipment is unique in Spain, having the highest resolution.
