Lithographic mask design
CAD system for designing any kind of mask for optical lithography. The design is transferred onto a copper-coated glass slide using electron beam lithography.
Description of the services offered
– Production of all types of optical lithography masks using designs selected by the client.
– Training in CAD design of masks for optical lithography equipment.
Needs requested and applications
This prototyping system makes it possible to produce a high resolution optical lithography mask, in line with the client¿s needs, in just a few hours.
Sector or area of application
Electronics, nanotechnology, optics and optoelectronics
Differential skills
The electron beam lithography equipment at the ISOM makes it possible to make designs of just a few nanometres which are subsequently transferred to optical lithography masks. The resolution obtained using this production method is far higher than laser lithography systems.
Previous references for provision of services
Where it is
ISOM. HTSE for Telecommunications
